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Multigate Medical Products Pty Ltd multigate device 200
Multigate Device 200, supplied by Multigate Medical Products Pty Ltd, used in various techniques. Bioz Stars score: 86/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/multigate+device/200+device+multigate/us12660242-383-9-9
Average 86 stars, based on 1 article reviews
multigate device 200 - by Bioz Stars, 2026-09
86/100 stars

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Modification:

Article Title: Metal gate for gate-all-around devices and methods for forming the same
Article Snippet: Turning to FIGS. 23A-23D, a planarization process is performed to remove excess gate materials from multigate device 200.

Article Title: Device and method of fabricating multigate devices having different channel configurations
Article Snippet: FIG. 1 is a flow chart of a method 100 for fabricating a multigate device according to various aspects of the present disclosure.

Article Title: Multigate device with stressor layers and method of fabricating thereof
Article Snippet: Thus, the present disclosure thus proposes methods and devices that provide for a stressor layer that is formed during the multigate device fabrication process and patterned to provide separate stressor profiles for NMOS and PMOS devices.

Article Title: Epitaxial source/drain structures for multigate devices and methods of fabricating thereof
Article Snippet: 6A-6M are implemented to fabricate multigate device 100B of FIG.

Isolation:

Article Title: Metal gate for gate-all-around devices and methods for forming the same
Article Snippet: Turning to FIGS. 23A-23D, a planarization process is performed to remove excess gate materials from multigate device 200.

Article Title: Device and method of fabricating multigate devices having different channel configurations
Article Snippet: FIG. 1 is a flow chart of a method 100 for fabricating a multigate device according to various aspects of the present disclosure.

Article Title: Multigate device with stressor layers and method of fabricating thereof
Article Snippet: Thus, the present disclosure thus proposes methods and devices that provide for a stressor layer that is formed during the multigate device fabrication process and patterned to provide separate stressor profiles for NMOS and PMOS devices.

Article Title: Epitaxial source/drain structures for multigate devices and methods of fabricating thereof
Article Snippet: 6A-6M are implemented to fabricate multigate device 100B of FIG.

In Situ:

Article Title: Metal gate for gate-all-around devices and methods for forming the same
Article Snippet: Turning to FIGS. 23A-23D, a planarization process is performed to remove excess gate materials from multigate device 200.

Article Title: Device and method of fabricating multigate devices having different channel configurations
Article Snippet: FIG. 1 is a flow chart of a method 100 for fabricating a multigate device according to various aspects of the present disclosure.

Article Title: Multigate device with stressor layers and method of fabricating thereof
Article Snippet: Thus, the present disclosure thus proposes methods and devices that provide for a stressor layer that is formed during the multigate device fabrication process and patterned to provide separate stressor profiles for NMOS and PMOS devices.

Article Title: Epitaxial source/drain structures for multigate devices and methods of fabricating thereof
Article Snippet: 6A-6M are implemented to fabricate multigate device 100B of FIG.

Blocking Assay:

Article Title: Metal gate for gate-all-around devices and methods for forming the same
Article Snippet: Turning to FIGS. 23A-23D, a planarization process is performed to remove excess gate materials from multigate device 200.

Article Title: Device and method of fabricating multigate devices having different channel configurations
Article Snippet: FIG. 1 is a flow chart of a method 100 for fabricating a multigate device according to various aspects of the present disclosure.

Article Title: Multigate device with stressor layers and method of fabricating thereof
Article Snippet: Thus, the present disclosure thus proposes methods and devices that provide for a stressor layer that is formed during the multigate device fabrication process and patterned to provide separate stressor profiles for NMOS and PMOS devices.

Article Title: Epitaxial source/drain structures for multigate devices and methods of fabricating thereof
Article Snippet: 6A-6M are implemented to fabricate multigate device 100B of FIG.



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86
Multigate Medical Products Pty Ltd multigate device 200
Multigate Device 200, supplied by Multigate Medical Products Pty Ltd, used in various techniques. Bioz Stars score: 86/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/multigate+device/200+device+multigate/us12660242-383-9-9
Average 86 stars, based on 1 article reviews
multigate device 200 - by Bioz Stars, 2026-09
86/100 stars
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